In Line Sputtering System

Features ILS5000 is industrial equipment for Solar Cell. ILS5000 System is comprised of several Chambers : Wafer Loading Stage, Load Lock, Trans Module, Buffer, Process chamber(ex. AI, AZO, ITO). Application Electronic components FPD's Solar cells Others Specifications Type of transport : Batch In-Line system(Inter back) Substrate size : 125mm x 125mm x 16PCS, 156mm x 156mm x 9PCS Sputter Gun : Dual Magnetron Sputtering Source Sputter Power : Pulse DC 20KW + RF 5KW Temp. range : <200? in Process Chamber Heat Uniformity : <±15°C ITO Film Uniformity :...

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• In Line Sputtering System made in Korea

Hybrid Coating System

Application Metal coating(Al, Ag, Sn, SUS, etc.) Sputter & Arc Multi layer Coating Available TiN, CrN, AIN for Hard Coating Specifications Sample Capacity : Phone Size case Max. 540ea Circular Type Magnetron Sputtering & Arc Ion Plating: Target Material – Various Metal(Cr, Ti, Al, Cu etc.): Dimension : 4" Target Sputter Source 11sets / 4" Target Arc source 7sets Rectangular Type Ion Beam Source : DC(5KW) High Vacuum Pumping System(Rotary + Booster + Diffusion Pump) Ultimate Pressure : Process Chamber 5 x 10-6 Torr within 3min Heating Temperature : Max. 350°C...

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• Hybrid Coating System made in Korea

Standard Asher. RIE System

Features - Reactive Ion etching(RIE) is an etching technology used in micro fabrication.- It uses chemically reactive plasma to remove material deposited on wafers.- High0energy ions from the plasma attack the wafer surface and react with it. Application Silicon etching Dielectrics etching(SiO2, Si3N4, etc) Polyamide etching Specifications Substrate Size : Piece to 6inch Max. Temperature : 700°C (On Heater) Process Gases Nozzle & RF Plasma Source Effective Area : 6inch RF Power Supply : 13.56MHz, 600W Gas Flow System -Flow Control Range : 0~100 scum-Gas : Ar, O2,...

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• Standard Asher made in Korea

Nano Wire Growing System

Features The Nano develops solutions for nanotube and nanowire synthesis. We manufacture process equipment suitable for the synthesis of a variety of one-dimensional nanostructures and nanomaterials. We are focused on addressing the specific process control challenges unique to this field by applying our broad experience in nanotechnology instrumentation and fabrication. Specification Main Quartz Tube Sample Holding Unit Using Al2O3 Ceramic Mechanical Rotary Vacuum Pump Max. Temperature : 1300°C Process Temperature Range : RT~1000°C Gas Type : Ar Vacuum&Power Controller...

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• Nano Wire Growing System made in Korea
• NPS 5000 Series made in Korea

Standard Sputtering System

Features Sputtering is used extensively in the semiconductor industry to deposit thin films of various metal and oxide materials. Thin anti-reflection coatings on glass for optical applications are also deposited by sputtering. Because of the low substrate temperatures used. Sputtering is MSS4000 is optimization equipment for R&D. Application Metal & Oxide coating Pt, Ti, Cu, Al and other metals ZnO, AZO, GZO, TiO2, SiO2 and other oxide materials Specification Magnetron Sputter Gun : 4inch Gun Type : Up to Down Film Thickness Uniformity : <±5% in 4inch Area...

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• Standard Sputtering System made in Korea

Standard ICP-RIE System

Features IRS5000 High density plasma etching system is a standard type that supports the application of general metal & dielectric material film & III-V compound Material etching process for the field of semiconductor, Optical, Nano and MEMS Device. Application Metal etching Al2O3, Si, SiO2, Si3N4 Etching Ashing Process MEMS Application Specifications Plasma Source : Specially Designed Antenna Module for High Density Plasma Sample Capacity : 4", 6" Wafer Source(ICP) Power : RF 1000W Bias Power : RF 600W High Vacuum Pumping system : Turbo Molecular Pump +...

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• Standard ICP-RIE System made in Korea

Rapid Thermal Process(RTP) System

Features Our RTP system is available with max 6inch wafer capability. This has been specially developed to meet the requirements of University, Research Laboratory. The Quality control and small scale production are possible Expressly, RTP is enable to easy and accurate temperature control and Data base(e.g. effect on Heating; Sample Temperature, Pressure…) Application RTA, RTO Diffusion, Metrication, Solicitation Crystallization, Diversification Implant Quality Control Specification Sample Size : 6inch Gas Flow Rate is Displayed on the LCD Monitor using Analog Signal...

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• Rapid Thermal Process System made in Korea
• RTP 5000 Series made in Korea

PE-CVD for Silicon Wafer Solar Cell

Features BCS5000 Plasma enhanced CVD system is batch-production equipment.That supports the application of silicon based thin film process of fearing step coverage and gap filling required during semiconductor fabrication and solar cell device processes, Including the applications of passivisation, isolation and dielectric insulation depositions. Application A-Si, Sio2, Si3N4 Deposition Passivisation, isolation Solar Cell Device Specification Sample Size : 156mm x 156mm x 4PCS Power Source : RF 13.56MHz Deposition Type : PECVD Plasma Type : Direct Plasma Substrate...

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• Silicon Wafer Solar Cell made in Korea

Standard PE-CVD System

Features Plasma Enhanced Chemical Vapor Deposition(PECVD) is a process used to deposit thin films from a gas state(vapor) to a solid state on some substrate. There are some chemical reactions involved in the process which occur after creation of a plasma of the reacting gases. Application SiOx, SixNy, a-Si etc. Passivisation, isolation Solar Cell Device Specifications Substrate Size : 6inch Max. Temperature : 700°C(On Heater) Substrate to Gas Nozzle Distance : 30mm ~ 100mm Adjustable(Manual) Power Source : RF 13.56MHz Gas Flow SystemFlow Control Range : 0~100 sccmGas :...

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• Standard PE-CVD System made in Korea
• SCS 5000 Series made in Korea

E-beam Evaporator System

Features EE-MPA system is industrial equipment for Mobile Phone Window Coating. Also, Our EE-MPA series is included Ion Source(cleaning) and Thermal evaporation(waterproof) pretreatment make the high quality coating before Evaporation. Application Various Metal(Al, Ni, Ti etc.) & Alloy Oxide(SiO2, TiO2, etc) Mobile Phone Window Coating Specifications Internal Dimension : 2050mm Dia. 1900(H) E-Beam Gun- 180° Deflection, 10KW(220V, 50/60Hz)- X-Y Sweeper & remote control- 25cc x 12Pocket(Motor Drive) Ion Gun- 140mm dia. 150mm(H)- DC 4KW(220V, 50/60Hz)- Pretreatment and...

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• E-beam Evaporator System made in Korea

CIGS Thin Film Solar Cell

Features CIGS 5000 Series as R&D equiprent for compound thin film solar cell is consist of Transfer, Load Lock, MBE, back contact Squttering and window sputtering Chambers. In CIGS series process Mo-back contact was deposited on a soda lime glass by sputtering system and the CIGS absorber layer over the Mo back contact growth technique using multi-source(Cu, In, Ga, Se) evaporation method. Then window layer consisted of ZnO or ITO thin film is coated by RF sputtering system. Specifications Deposition thickness up to several ten thousands A for Mo, CIGS and ZnO film Film...

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• Solar Cell made in Korea

Large Area Rapid Thermal Annealing System

Features LRS5000 system is batch-production equipment that supports annealing process the quality control and large-scale production are possible. The high reliability assures low cost of ownership. Specification Square Chamber(internal size : 660mm x 660mm x 150mm)- cold wall & contamination free Sample Capacity : 125mm x 125mm x 16PCS, 156mm x 9PCS Maximum Temperature : 1200°C Process Temperature Range : 300~1100°C Sustain Time : More than 2min. at 1100°C Limping Rate : 10 to 20°C / sec Cooling Rate : 5 to 10°C / sec Heating Uniformity : Less than <...

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• Large Area Rapid Thermal made in Korea
• Annealing System made in Korea
• LRS 5000 Series made in Korea

Cluster Multi Sputtering System

Features CSS5000 is industrial equipment for MEMS Device. CSS5000 System is comprised of cluster type Chambers Load Lock, Unload Lock, Trans Module, 3 Process Module Application Metal & Oxide Coating Multi layer coating MEMS Application Specifications Sample Size : 4.75 ~ 12.5inch Process Chamber : 3set Vacuum pumping system : (Rotary + TMP, etch process chamber) Magnetron sputter source : 16inch Sputter Gun x 3ea Sample Rotation : Rotation only Sample Heating Source L Circular 12.5inch Thermocouple + Pyrometer(1set) Sample sub-sector : 4.75, 6, 6.5, 7, 8,...

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• Cluster Multi Sputtering System made in Korea

R&D Total Solution for Solar Application

Features Plasma Enhanced CVD is an excellent alternative for depositing a variety of thin films at lower temperature than those utilized in CVD reactors without setting for a lesser film quality. PECVD uses electrical energy to generate a glow Discharge(Plasma) in which the energy is transferred into a gas Mixture. Some of the desirable properties of PECVD films are good adhesion, low pinhole density, Good step coverage, and uniformity. Specifications Sample Size : 150mm x 150mm Power Source : RF 13.56MHz, VHF 60MHz Deposition Type : PECVD, VHFCVD Plasma Type : Direct Plasma...

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• Solar Application made in Korea
• R&D Total Solution made in Korea