Protection Gate Valve
** Application - Etch, CVD (MO, PE, HDP, LP)Implant, Sputtering - Nanotechnology process with high particulate levels - Thin film photovoltaic panels |
** Features - Protects process environment from back-streaming powder in the event of dry pump failure - Reduces expensive down time in powder producing process Fast pneumatic actuation-closes in <0.5 seconds(Normal 0.7seconds) - Long cycle life under adverse process conditions |
** Options - Available with either ISO 100-K or ISO 160-K flanges - 1, 2, 3 or 4 channel options |
<img src="http://www.bestmadeinkorea.com/photo/2015/jc/Protection-Gate-Valve-01.jpg" alt="Protection-Gate-Valve-01.jpg" >
<img src="http://www.bestmadeinkorea.com/photo/2015/jc/Protection-Gate-Valve-02.jpg" alt="Protection-Gate-Valve-02.jpg" >
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