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2011/10/31
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KSN
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Sputter,Sputtering,Vacuum Evaporator,Vacuum Coating System,Used Sputter,Used Sputtering,Used Vacuum Evaporator,Used Vacuum Coating System
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2318000 - 0100
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AMS-0401D
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1
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USA
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CLIO
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Diaphragm Metalligations
Special Features
Roll to Roll System for mass production.
PC control based on PLC.
Metal deposition on flexible film
Flexible film thickness: 2um
Speedy deposition and throughput
Loading capacity : 5km per day
Average throughput 1,800km per year
Specifications
Dimension : 2,714L x 3,393H x 2,008W
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Multi-functional cluster system combined with PECVD, sputter and E-beam evaporation for high quality graphene synthesis.
Special Features
Multi-functional cluster system combined with PECVD, sputter and E-beam evaporation for high quality graphene synthesis.
Maximum substrate heater temperature: 1,000°C for PECVD, 800°C for Sputter and
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Touch Screen Panel manufacturing
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Deposition of low melting point materials(ex, Al, Mg, etc.)
Special Features
Thermal evaporation with roll coating system for mass production.
Continuous Al feeder system.
Speedy deposition and throughput.
Specifications
Loading capacity : 5km per day
Average throughput : 15,000km per year
Dimension : 1,730L × 1,200H × 1,000W
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The Desk Sputter Coater is able to coat non-oxidising metals - such as gold (Au) , Silver (Ag), Palladium ( Pa)and platinum (Pt) thin films on non-conductive or poorly conductive specimens uniformly and fine-grain size in fast cycle time .
The good design of the system able the user easily to load and unloading of samples and quickly change the
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Release coating of precision mold for forming digital camera and mobile phone lenses
Special Features
Ion beam-assisted dc sputter system for release coating on precision mold.
Equipped with three sputter guns and one ion gun.
Multilayer deposition and codeposition available.
Substrate heated up to optimum value in a short period, using
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SiC coating, CNTs growth Normal CVD process
Special Features
Thermal CVD system for SiC coating with MTS bubbler system.
PC control based on PLC.
Convenient Al2O3 tube setup.
Ion exchange type scrubber for SiH4 and Cl gases.
High sensitivity gas detectors for H2, Cl, C3H8.
Uniform 3 heating zone.
Specifications Heating range ~
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Touch Screen Panel manufacturing
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CNTs growth
Special Features
Small DC arc discharge system for CNT(Carbon Nano Tube) synthesis.
SWNT and MWNT synthesis.
Average throughput Up to 10kg per year.
Carbon rod : 6phi × 30 mm.
Specifications
Dimension : 800L × 1,000H × 600W (mm3)
Power: DC 2kW
Gas : He/H2/Ar
Pump :
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The web coater was precisely designed for researchers studying in many thin film related fields, especially for TCOs in flat panel display.
Applications
TCOs coatings
Metallization or passivation coatings
Summarized Features
Web coating system equipped up to 4 sputter cathodes for R&D and a small scale of production.
Automatic
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BBAR and Magenta AR
Mirror coatings
Other various optical applications
Special Features
Cost effective multilayer coatings for functional coatings like antireflective and mirror applications of ophthalmic lenses.
Sputter system for multi-functional coatings with various size of lenses.
Specifications
Lens loading capacity : 4
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Optical devices
Barrier layer
Solar cell
Special Features
High density PECVD system for a-Si:H and nc-Si:H layer.
Low temperature deposition of a-Si:H layer(under about 300°C).
Robot transporting system.
Specifications
Wafer capacity : 1 × 4"
Average throughput : Up to 5,000 wafers per year
Dimension : 2,100L × 1,700H ×
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Dielectric materials in EL display device
Special Features
E-beam evaporation system for small scale organic EL device production.
In-line processed with glove box.
Side-sliding door type.
Smooth surface(RMS roughness < 20 nm).
Specifications
Wafer capacity : 1 × 5"
Average throughput Up to 5,000 wafers per year
Dimension :
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Applicable to various R&D fields that sputter deposition of metals and ceramic materials is necessary.
Application areas: semiconductor, display, solar cell, biochips, new materials,
Special Features
RF or DC magnetron sputter for multipurpose R&D.
Codeposition and multilayer deposition available.
RF to DC power supply easily changed
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Metal coatings
Barrier layers
Special Features
Magnetron sputter system for R&D and small scale production.
High speed pumping system equiped with cryogenic pump.
Automatic robot loading system.
Automatic positioning system between guns and substrate.
Convenient control on touch screen.
Specifications
Power : AC 2kW (13.56MHz), DC
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SiNx dielectric material coating
SiOx dielectric material coating
SiOxNy dielectric material coating
Special Features
Capacitively-Coupled PECVD system with loadlock chamber for R&D and small scale production.
Automatic loadlock system with cassette.
Uniform gas distribution through shower head.
Specifications
Substrate temperature
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Hard materials coating(eg. CrN, TiN, TiAlN)
Anti-corrosive coating(eg. ZrN)
Special Features
Vacuum arc system for mass production(base pressure: 1 X 10-6 Torr).
Pumping system equiped with mechanical booster and oil diffusion pumps.
Automatically or manually controlled in substrate revolution and rotation.
Batch type of substrate
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- We take pride in our Roll to Roll Sputter Vacuum equipment production and processing technologies,
based on a techniquedepositing metal on the polymer surface.
- Roll-to-roll sputtering equipment manufacturing and process technology has
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Ferromagnetic materials deposition
Oxides deposition
Metals deposition
Special Features
Ultra-high-vacuum sputter system for R&D and small scale production(base pressure: 6 X 10-9 Torr).
Pumping system equiped with ion and turbo molecular pumps.
Predeposition process of oxides or metals in load-lock chamber.
Automatic mask loading