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The standard system was functionally designedfor researchers studying in many thin film relatedfields. It was also considered for beginners toconveniently approach deposition process andequipment maintenance.
FeaturesDeposition of metallic andinorganic layers is not onlyavailable, but partially applicableto organic materials deposition
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General Specification
-Chamber material : Stainless steel (SUS 304L)-Ultimate pressure : = 8.0×10-7 torr / 24hrs Leak rate : = 1.0×10-9 torr·l/sec (with He Leak Detector)-Target : Metal – Al, Cr, Ni, Mo, Au, Ag etc Oxide – ITO, SiO2, TiO2 etc-Control system : HMI control (PLC + PC
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Introduction
SukWon is developing and supplying special cathodes for a variety of sputter systems.In addition, we are supplying high-efficiency cathodes through partnership with customers.
Manufacturing cathodes with various target materials, such as ITO, SiO2, Cr
Manufacturing general and high-efficiency cathodes
Custom-manufacturing
-
Introduction
SukWon is developing and supplying special cathodes for a variety of sputter systems.In addition, we are supplying high-efficiency cathodes through partnership with customers.
Manufacturing cathodes with various target materials, such as ITO, SiO2, Cr
Manufacturing general and high-efficiency cathodes
Custom-manufacturing