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Optical coatings
Hard coatings
Metal coatings
Polymer surface modifications
Coatings for flat panel display electorates
Special Features
In-line sputter system with 8ea linear sputter guns for R&D and a small-scale production.
Automatic process control through PLC interfacing.
Carrier loading capability : 2x24"
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Available Excavators
1. KUBOTA - U-08 / U-10 / U-17 / U-20 / U-30 / KX-57 U-55
2. KOMATSU - PC18MR / PC20MR / PC30MR / PC50
3. YANMAR - SV08 / VIO15 / VIO15 / VIO20 / VIO30 / VIO35 / VIO55
4. KOBELCO - SK10 / SK17 / SK20 / SK27 / SK30 / SK35 / SK55
5. HITACHI - ZX8U / ZX10U / ZX17U / ZX30U / ZX35U / ZX50U
6. IHI -
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CNTs growth
Special Features
Small DC arc discharge system for CNT(Carbon Nano Tube) synthesis.
SWNT and MWNT synthesis.
Specifications
Carbon rod : ~12phi x 300mm
Average throughput : Up to 10kg per year
Dimension : 1000L x 1400H x 650W(mm3)
Power : DC 2kW
Gas : He/H2/Ar
Pump : rotary(600
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X-ray mirror
Neutron mirror
Reflective optics for EUV lithography
Special Features
Ion beam sputtering system for precision optics.
Layer deposition and deposited layer milling, sequentially processed, with two ion guns.
Substrate rotation for uniform deposition.
Automatic distance control between ion guns and substrate.
Target rotated
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Available Excavators
1. KUBOTA - U-08 / U-10 / U-17 / U-20 / U-30 / KX-57 U-55
2. KOMATSU - PC18MR / PC20MR / PC30MR / PC50
3. YANMAR - SV08 / VIO15 / VIO15 / VIO20 / VIO30 / VIO35 / VIO55
4. KOBELCO - SK10 / SK17 / SK20 / SK27 / SK30 / SK35 / SK55
5. HITACHI - ZX8U / ZX10U / ZX17U / ZX30U / ZX35U / ZX50U
6. IHI -
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Available Excavators
1. KUBOTA - U-08 / U-10 / U-17 / U-20 / U-30 / KX-57 U-55
2. KOMATSU - PC18MR / PC20MR / PC30MR / PC50
3. YANMAR - SV08 / VIO15 / VIO15 / VIO20 / VIO30 / VIO35 / VIO55
4. KOBELCO - SK10 / SK17 / SK20 / SK27 / SK30 / SK35 / SK55
5. HITACHI - ZX8U / ZX10U / ZX17U / ZX30U / ZX35U / ZX50U
6. IHI -
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Lighly crystalline SWCNTs synthesis
Special Features
Arc discharge synthesis of high quality SWCNTs.
Automatically controlled sequential process of electrode loading, discharge, CNTs synthesis and their recovery.
Equipped with specially designed CNTs recovery chamber in main chamber.
Catalyst loading into drilled anode.
Cassette loading
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Optical device
Optical wave guide
Passivation layer
Special Features
RF sputtering system for R&D and small scale production.
Excellent thickness uniformity and surface morphology in deposited layers.
Silicon and reactive silicon oxide deposition.
Automatically movable substrate holder.
Specifications
Wafer capacity : 1 x
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Available Excavators
1. KUBOTA - U-08 / U-10 / U-17 / U-20 / U-30 / KX-57 U-55
2. KOMATSU - PC18MR / PC20MR / PC30MR / PC50
3. YANMAR - SV08 / VIO15 / VIO15 / VIO20 / VIO30 / VIO35 / VIO55
4. KOBELCO - SK10 / SK17 / SK20 / SK27 / SK30 / SK35 / SK55
5. HITACHI - ZX8U / ZX10U / ZX17U / ZX30U / ZX35U / ZX50U
6. IHI -
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Available Excavators
1. KUBOTA - U-08 / U-10 / U-17 / U-20 / U-30 / KX-57 U-55
2. KOMATSU - PC18MR / PC20MR / PC30MR / PC50
3. YANMAR - SV08 / VIO15 / VIO15 / VIO20 / VIO30 / VIO35 / VIO55
4. KOBELCO - SK10 / SK17 / SK20 / SK27 / SK30 / SK35 / SK55
5. HITACHI - ZX8U / ZX10U / ZX17U / ZX30U / ZX35U / ZX50U
6. IHI -
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Hard coating
Tribological coating
Optical coating
Special Features
Ion-assisted unbalanced magnetron sputtering system for DLC deposition.
Highly charged partices with a high kinetic energy.
High degree of flexibility for various substrate materials.
Average throughput : Up to 720,000 pcs per year
Specifications
Loading capacity :
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Optical device
Passivation layer
Constantan materials
Special Features
4x6" sputter system for R&D and small scale production.
Excellent thickness uniformity(below +-2.8% for the layer of 228.6 nm in thickness).
Highly smooth surface(RMS roughness of deposited layer: 25 Ã…).
RF/DC magnetron sputter.
Automatic loading system.
Average
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Available Excavators
1. KUBOTA - U-08 / U-10 / U-17 / U-20 / U-30 / KX-57 U-55
2. KOMATSU - PC18MR / PC20MR / PC30MR / PC50
3. YANMAR - SV08 / VIO15 / VIO15 / VIO20 / VIO30 / VIO35 / VIO55
4. KOBELCO - SK10 / SK17 / SK20 / SK27 / SK30 / SK35 / SK55
5. HITACHI - ZX8U / ZX10U / ZX17U / ZX30U / ZX35U / ZX50U
6.
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Hard materials coating(eg. CrN, TiN, TiAlN)
Anti-corrosive coating(eg. ZrN)
Special Features
Vacuum arc system for mass production(base pressure: 1 X 10-6 Torr).
Pumping system equiped with mechanical booster and oil diffusion pumps.
Automatically or manually controlled in substrate revolution and rotation.
Batch type of substrate
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Diaphragm Metalligations
Special Features
Roll to Roll System for mass production.
PC control based on PLC.
Metal deposition on flexible film
Flexible film thickness: 2um
Speedy deposition and throughput
Loading capacity : 5km per day
Average throughput 1,800km per year
Specifications
Dimension : 2,714L x 3,393H x 2,008W
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Available Excavators
1. KUBOTA - U-08 / U-10 / U-17 / U-20 / U-30 / KX-57 U-55
2. KOMATSU - PC18MR / PC20MR / PC30MR / PC50
3. YANMAR - SV08 / VIO15 / VIO15 / VIO20 / VIO30 / VIO35 / VIO55
4. KOBELCO - SK10 / SK17 / SK20 / SK27 / SK30 / SK35 / SK55
5. HITACHI - ZX8U / ZX10U / ZX17U / ZX30U / ZX35U / ZX50U
6.
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Deposition of low melting point materials(ex, Al, Mg, etc.)
Special Features
Thermal evaporation with roll coating system for mass production.
Continuous Al feeder system.
Speedy deposition and throughput.
Specifications
Loading capacity : 5km per day
Average throughput : 15,000km per year
Dimension : 1,730L × 1,200H × 1,000W
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Release coating of precision mold for forming digital camera and mobile phone lenses
Special Features
Ion beam-assisted dc sputter system for release coating on precision mold.
Equipped with three sputter guns and one ion gun.
Multilayer deposition and codeposition available.
Substrate heated up to optimum value in a short period, using
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Available Excavators
1. KUBOTA - U-08 / U-10 / U-17 / U-20 / U-30 / KX-57 U-55
2. KOMATSU - PC18MR / PC20MR / PC30MR / PC50
3. YANMAR - SV08 / VIO15 / VIO15 / VIO20 / VIO30 / VIO35 / VIO55
4. KOBELCO - SK10 / SK17 / SK20 / SK27 / SK30 / SK35 / SK55
5. HITACHI - ZX8U / ZX10U / ZX17U / ZX30U / ZX35U / ZX50U
6.
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CNTs growth
Special Features
Small DC arc discharge system for CNT(Carbon Nano Tube) synthesis.
SWNT and MWNT synthesis.
Average throughput Up to 10kg per year.
Carbon rod : 6phi × 30 mm.
Specifications
Dimension : 800L × 1,000H × 600W (mm3)
Power: DC 2kW
Gas : He/H2/Ar
Pump :