Developed itmes

- Ion beam source

- Arc source

- Filtered cathodic vacuum arc system and process

- LPCVD for nanotube synthesis

- Silica PECVD system

- UHV(Ultra High Vacuum) sputtering system

- Silica TCP (Transformer Coupled Plasma) etcher

- UHV-sputter system for ferromagnetic multilayers

- Vacuum arc system for nitrides deposition

- In-line system of vacuum arc deposition for protecting PDP

electrodes

- High vacuum test system for a flat light source evaluation

- Multifunctional standard sputtering system for R&D

- NPPN(New Post Plasma Nitriding) System

- Sputter for polygon mirror applicable to laser printer

- Production scale of arc ion plating (AIP) system

- Ion beam sputter for precision optics

- Production scale of AIP and NPPN systems

- Ion plating system for various coloration

- Pilot scale of arc discharge equipment for CNT transparent electrode

sputter web coater for flexible display research

- Sputter system for ophthalmic

- Polycrystalline silicon ingot growing equipment

- PECVD system for anti-reflective coatings on solar cell

- PECVD system for graphene deposition

- Al plasma nitriding equipment for mass production with KAITECH

- Equipment of carbon nanotube using electrical arc discharge method

- Graphene PECVD-PVD Cluster equipment