| Sputtering Target (N0629)
Description
Raw-materials of the Thin Film coating used in semiconductor and display industries. Sputtering means that atoms of the target material bounce out from the surface, exchanging momentum by perfect elastic collision, when a high-energy particle is collided on the solid surface.
Sputtering in the thin film coating can be considered as the concept that includes the two processes of emission of the target atom and attachment of the atom on the substrate. The most prominent feature of sputtering is that almost every material can be used as a target. (Physical Performance)
Sputtering Target
Description
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