ZESTONE-III

Manufacturers are tending to use silicon wafers of larger and larger diameter in the production of semiconductor devices, and the adoption of 300mm (12-inch) wafers is just around the corner. Hitachi Kokusai Electric has developed its ZESTONE-III series of Vertical Diffusion/CVD Systems with the needs of the upcoming 300mm era in mind. The series incorporates key technologies of the VERTEX-III, which has established an excellent performance record with customers around the world, and features exceptional reliability and high throughput with low cost of ownership. Benefits and Features High throughput through 100 sheets batch process of 300mm wafers. Actualizes excellent yield rate of production line with superb uniformity and low particle generation by optimizing process conditions and air flow inside the equipment. With double batch cassette storage, continuous batch processing is available. Actualizes highly efficient wafer transfer by 5 wafers/single wafer transfer robot(B-type). dditional supplementation of short wafer by wafer counting system is enabled. SEMI compliant cassette I/O port. Since side-by-side unit placement is enabled, floor space can be minimized. CX 3000 tube controller compatible with 8 inch processing system. Specifications Classification Wafer Diameter Batch Size Cassette Cassette Racks Cassette I/O Tube Controller Dimensions (WxDxH) ZESTONE-III(B Type) 300mm 100 Wafers 13 or 25 wafers.(FOUP) Max. 12 Cassettes 2 Cassettes CX-3000(color TFT) 1100x2500x3300mm