AURORA - Magnetron Sputtering System

AURORA - Magnetron Sputtering System

AURORA - Magnetron Sputtering System Made in Korea

Description

AURORA provides customer with a high quality & reliable thin film deposition. Magnetron sputtering sources are specially designed for maximum erosion rate.AURORA offers a low risk manufacturing solution. Application Dielectric layers(High K) and conductive electrodes for transistor gate and memory cell, passivation and diffusion barrier, seed layers(metal liners) and conductive layers for IC interconnection Technology DC, reactive, RF-sputtering system Cathodes are DC / RF compatible Optimized magnetron source design for a high target utilization Substrate pretreatment by means of heating Simple & compact system design for small footprint User friendly control system Specification 1 process chamber system 1 load lock chambers with standard wafer magazines Linear sample transfer Substrate dimensions up to 8" Substrate heating max. 900 °C Turbo molecular pump of high-vacuum pumping Booster & oil rotary combination pump of low-vacuum pumping system Auto pressure control with throttle valve Circular or rectangular type of sputter source Sputter power DC 300~3000W, RF generator 600W~3000Wwith 13.56MHz auto matching box Gas delivery module with mass flow controller Manual / PC, PLC control including Windows user interfacefor fully automatic process control

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