AURORA provides customer with a high quality & reliable thin film deposition. Magnetron sputtering sources are specially designed for maximum erosion rate.AURORA offers a low risk manufacturing solution.
Application
Dielectric layers(High K) and conductive electrodes for transistor gate and memory cell, passivation and diffusion barrier, seed layers(metal liners) and conductive layers for IC interconnection
Technology
DC, reactive, RF-sputtering system
Cathodes are DC / RF compatible
Optimized magnetron source design for a high target utilization
Substrate pretreatment by means of heating
Simple & compact system design for small footprint
User friendly control system
Specification
1 process chamber system
1 load lock chambers with standard wafer magazines
Linear sample transfer
Substrate dimensions up to 8"
Substrate heating max. 900 °C
Turbo molecular pump of high-vacuum pumping
Booster & oil rotary combination pump of low-vacuum pumping system
Auto pressure control with throttle valve
Circular or rectangular type of sputter source
Sputter power DC 300~3000W, RF generator 600W~3000Wwith 13.56MHz auto matching box
Gas delivery module with mass flow controller
Manual / PC, PLC control including Windows user interfacefor fully automatic process control
AURORA - Magnetron Sputtering System
Description
Product Inquiry
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Payment & Shipping Conditions:
- Payment: We accept payment through Paypal Only.
- Shipping: We will ship the catalog once the payment is received. And you will be receiving the catalog with in 10 -14 busines days. Shipping might be delayed in due to international shipping conditions which is depends on the countries receiveing. In case hard copy of catalog is not available then we will ship the soft copy.
- Refund: We can refund the order before shipping process was initiated. Incase Catalog not available, we will make sure to refund the order.
- Note: This is a Catalog Produt.
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