OZONE - Hot Wire(Catalytic) Chemical Vapor...

OZONE - Hot Wire(Catalytic) Chemical Vapor...

OZONE - Hot Wire(Catalytic) Chemical Vapor... Made in Korea

Description

OZONE has been used to deposit high quality of poly & amorphous silicon film at low substrate temperature. It offers a low risk manufacturing solution, high profit via high productivity to customer. Application Mainly, Poly silicon films for flat panel display, amorphous silicon solar cells, diamond like carbon coating, carbon nano tube growth, AM-OLED Technology Unique gas shower head design for film uniformity Designed for large area deposition High process productivity Filament design for long life & easy maintenance Specification 1 process chamber 1 load lock chamber with standard wafer magazines Linear sample transfer Substrate dimensions up to 370mm x 400mm Substrate heating max. 1,000°C Turbo molecular pump of high-vacuum pumping Auto pressure control with throttle valve Gas delivery module with mass flow controller Manual / PC, PLC control including Windows user interface for fully automatic process control

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