Multi Roll-to-roll sputter system for the high transmittance ITO touch film
Multi Roll-to-Roll sputter apparatus for depositing the high transmittance ITO film
This system, which is for producing high transmittance ITO film, consist of the chamber for processing oxides such as SiO2, Nb2O5 and multi-chamber that makes it possible to deposit successively because the chamber of transmittable film is divided.
- Film specification : 1250mmW x 1000M
- Web thickness : 25um ~ 188um
- Power supply specification : 220 ~ 480Vac, 3 phase, 50 ~ 60Hz
- Source power supply : Pulsed DC, MF
- Pre-treatment specification : DC bombardment, Ion-gun, RF, etc.
- Deposition materials : ITO, SiO2, Nb2O5
- Number of chamber : 7
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