RF Sputtering System with 2x7 and 2x4 Guns Manufacturers,RF Sputtering System with 2x7 and 2x4 Guns Suppliers

Description

Optical device

Optical wave guide

Passivation layer

Special Features

RF sputtering system for R&D and small scale production.

Excellent thickness uniformity and surface morphology in deposited layers.

Silicon and reactive silicon oxide deposition.

Automatically movable substrate holder.

Specifications

Wafer capacity : 1 x 6"

Average throughput Up to 5,000 wafers per year

Dimension : 1,730L x 1,277H x 725W (mm3)

Power : AC 1.2kW (13.56MHz)

AC 600W (13.56MHz)

DC 1kW (optional)

Gas : Ar / O2

Heater : silicon carbide(heating rate: 40°C/min, max. temp.: 850°C, deviation: negligible)

Pump : rotary(600l/mim) & cryogenic(900l/s)

Your Name:
Your E-Mail:
Telephone Number:
Fax Number:
Your Country & Territory:
Address:
Subject:
Product Quantity Looking for:
Your Message:	Note: Please clealry menction the product/product names, Model, Size & other specifications that will help us to reply you as soon as possible.
Additional Details Required:	Minimum Order Quantity Payment Terms More Product Details Availability / Cost Shipping Details Certificates Expected Delivery Lead Time
Confirm Text:

Payment: We accept payment through Paypal Only.
Shipping: We will ship the catalog once the payment is received. And you will be receiving the catalog with in 10 -14 busines days. Shipping might be delayed in due to international shipping conditions which is depends on the countries receiveing. In case hard copy of catalog is not available then we will ship the soft copy.
Refund: We can refund the order before shipping process was initiated. Incase Catalog not available, we will make sure to refund the order.
Note: This is a Catalog Produt.