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Lighly crystalline SWCNTs synthesis
Special Features
Arc discharge synthesis of high quality SWCNTs.
Automatically controlled sequential process of electrode loading, discharge, CNTs synthesis and their recovery.
Equipped with specially designed CNTs recovery chamber in main chamber.
Catalyst loading into drilled anode.
Cassette loading
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Optical device
Optical wave guide
Passivation layer
Special Features
RF sputtering system for R&D and small scale production.
Excellent thickness uniformity and surface morphology in deposited layers.
Silicon and reactive silicon oxide deposition.
Automatically movable substrate holder.
Specifications
Wafer capacity : 1 x
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Available Excavators
1. KUBOTA - U-08 / U-10 / U-17 / U-20 / U-30 / KX-57 U-55
2. KOMATSU - PC18MR / PC20MR / PC30MR / PC50
3. YANMAR - SV08 / VIO15 / VIO15 / VIO20 / VIO30 / VIO35 / VIO55
4. KOBELCO - SK10 / SK17 / SK20 / SK27 / SK30 / SK35 / SK55
5. HITACHI - ZX8U / ZX10U / ZX17U / ZX30U / ZX35U / ZX50U
6. IHI -
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Available Excavators
1. KUBOTA - U-08 / U-10 / U-17 / U-20 / U-30 / KX-57 U-55
2. KOMATSU - PC18MR / PC20MR / PC30MR / PC50
3. YANMAR - SV08 / VIO15 / VIO15 / VIO20 / VIO30 / VIO35 / VIO55
4. KOBELCO - SK10 / SK17 / SK20 / SK27 / SK30 / SK35 / SK55
5. HITACHI - ZX8U / ZX10U / ZX17U / ZX30U / ZX35U / ZX50U
6. IHI -
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Hard coating
Tribological coating
Optical coating
Special Features
Ion-assisted unbalanced magnetron sputtering system for DLC deposition.
Highly charged partices with a high kinetic energy.
High degree of flexibility for various substrate materials.
Average throughput : Up to 720,000 pcs per year
Specifications
Loading capacity :
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Optical device
Passivation layer
Constantan materials
Special Features
4x6" sputter system for R&D and small scale production.
Excellent thickness uniformity(below +-2.8% for the layer of 228.6 nm in thickness).
Highly smooth surface(RMS roughness of deposited layer: 25 Ã…).
RF/DC magnetron sputter.
Automatic loading system.
Average
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Available Excavators
1. KUBOTA - U-08 / U-10 / U-17 / U-20 / U-30 / KX-57 U-55
2. KOMATSU - PC18MR / PC20MR / PC30MR / PC50
3. YANMAR - SV08 / VIO15 / VIO15 / VIO20 / VIO30 / VIO35 / VIO55
4. KOBELCO - SK10 / SK17 / SK20 / SK27 / SK30 / SK35 / SK55
5. HITACHI - ZX8U / ZX10U / ZX17U / ZX30U / ZX35U / ZX50U
6.
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Hard materials coating(eg. CrN, TiN, TiAlN)
Anti-corrosive coating(eg. ZrN)
Special Features
Vacuum arc system for mass production(base pressure: 1 X 10-6 Torr).
Pumping system equiped with mechanical booster and oil diffusion pumps.
Automatically or manually controlled in substrate revolution and rotation.
Batch type of substrate
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Diaphragm Metalligations
Special Features
Roll to Roll System for mass production.
PC control based on PLC.
Metal deposition on flexible film
Flexible film thickness: 2um
Speedy deposition and throughput
Loading capacity : 5km per day
Average throughput 1,800km per year
Specifications
Dimension : 2,714L x 3,393H x 2,008W
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Available Excavators
1. KUBOTA - U-08 / U-10 / U-17 / U-20 / U-30 / KX-57 U-55
2. KOMATSU - PC18MR / PC20MR / PC30MR / PC50
3. YANMAR - SV08 / VIO15 / VIO15 / VIO20 / VIO30 / VIO35 / VIO55
4. KOBELCO - SK10 / SK17 / SK20 / SK27 / SK30 / SK35 / SK55
5. HITACHI - ZX8U / ZX10U / ZX17U / ZX30U / ZX35U / ZX50U
6.
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Deposition of low melting point materials(ex, Al, Mg, etc.)
Special Features
Thermal evaporation with roll coating system for mass production.
Continuous Al feeder system.
Speedy deposition and throughput.
Specifications
Loading capacity : 5km per day
Average throughput : 15,000km per year
Dimension : 1,730L × 1,200H × 1,000W
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Release coating of precision mold for forming digital camera and mobile phone lenses
Special Features
Ion beam-assisted dc sputter system for release coating on precision mold.
Equipped with three sputter guns and one ion gun.
Multilayer deposition and codeposition available.
Substrate heated up to optimum value in a short period, using
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Available Excavators
1. KUBOTA - U-08 / U-10 / U-17 / U-20 / U-30 / KX-57 U-55
2. KOMATSU - PC18MR / PC20MR / PC30MR / PC50
3. YANMAR - SV08 / VIO15 / VIO15 / VIO20 / VIO30 / VIO35 / VIO55
4. KOBELCO - SK10 / SK17 / SK20 / SK27 / SK30 / SK35 / SK55
5. HITACHI - ZX8U / ZX10U / ZX17U / ZX30U / ZX35U / ZX50U
6.
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CNTs growth
Special Features
Small DC arc discharge system for CNT(Carbon Nano Tube) synthesis.
SWNT and MWNT synthesis.
Average throughput Up to 10kg per year.
Carbon rod : 6phi × 30 mm.
Specifications
Dimension : 800L × 1,000H × 600W (mm3)
Power: DC 2kW
Gas : He/H2/Ar
Pump :
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BBAR and Magenta AR
Mirror coatings
Other various optical applications
Special Features
Cost effective multilayer coatings for functional coatings like antireflective and mirror applications of ophthalmic lenses.
Sputter system for multi-functional coatings with various size of lenses.
Specifications
Lens loading capacity : 4
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Available Excavators
1. KUBOTA - U-08 / U-10 / U-17 / U-20 / U-30 / KX-57 U-55
2. KOMATSU - PC18MR / PC20MR / PC30MR / PC50
3. YANMAR - SV08 / VIO15 / VIO15 / VIO20 / VIO30 / VIO35 / VIO55
4. KOBELCO - SK10 / SK17 / SK20 / SK27 / SK30 / SK35 / SK55
5. HITACHI - ZX8U / ZX10U / ZX17U / ZX30U / ZX35U / ZX50U
6. IHI -
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Dielectric materials in EL display device
Special Features
E-beam evaporation system for small scale organic EL device production.
In-line processed with glove box.
Side-sliding door type.
Smooth surface(RMS roughness < 20 nm).
Specifications
Wafer capacity : 1 × 5"
Average throughput Up to 5,000 wafers per year
Dimension :
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Metal coatings
Barrier layers
Special Features
Magnetron sputter system for R&D and small scale production.
High speed pumping system equiped with cryogenic pump.
Automatic robot loading system.
Automatic positioning system between guns and substrate.
Convenient control on touch screen.
Specifications
Power : AC 2kW (13.56MHz), DC
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The Desk Sputter Coater is able to coat non-oxidising metals - such as gold (Au) , Silver (Ag), Palladium ( Pa)and platinum (Pt) thin films on non-conductive or poorly conductive specimens uniformly and fine-grain size in fast cycle time .
The good design of the system able the user easily to load and unloading of samples and quickly change the
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Hard materials coating(eg. CrN, TiN, TiAlN)
Anti-corrosive coating(eg. ZrN)
Special Features
Vacuum arc system for mass production(base pressure: 1 X 10-6 Torr).
Pumping system equiped with mechanical booster and oil diffusion pumps.
Automatically or manually controlled in substrate revolution and rotation.
Batch type of substrate